发明名称 印刷用凸版の製造方法
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a resin relief printing plate for forming a large size organic EL element using a relief printing method, in which splay developing method is used when patterning with a photolithographic method to obtain a printing plate with a high pattern accuracy and free from nonuniformity of development, and a relief printing plate obtained by the method. <P>SOLUTION: The manufacturing method comprises: an exposure step in which a photosensitive resin as a plate material is exposed; and a development step in which the exposed pattern on the photosensitive resin is developed. The development step includes: an immersion stage in which the plate material is entirely immersed in a developer; a developing stage in which unnecessary portion of the immersed photosensitive resin is removed with a developer splayed from a splay type nozzle to develop the pattern on the photosensitive resin; a cleaning stage in which residue of the developer on the developed photosensitive resin is removed with a cleaning liquid splayed from a splay type nozzle; and a cleaning liquid removal stage in which the cleaning liquid is removed by splaying a gas to the surface of the cleaned photosensitive resin. Plate material transportation sections of at least the developing stage and the cleaning stage are inclined at an angle with respect to a horizontal face perpendicular to a transportation direction of the plate material. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP5771906(B2) 申请公布日期 2015.09.02
申请号 JP20100122711 申请日期 2010.05.28
申请人 凸版印刷株式会社 发明人 石川 宏典;福永 悟大
分类号 G03F7/30;G03F7/00;G03F7/11;H01L51/50;H05B33/10 主分类号 G03F7/30
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