| 摘要 |
<P>PROBLEM TO BE SOLVED: To construct a process capable of safely forming a negative tone pattern. <P>SOLUTION: A pattern is formed by applying a resist composition comprising: a (meth)acrylate polymer having a repeating unit a having a carboxyl group substituted with an acid labile group represented by the formula (1) and a repeating unit b having a lactone ring, an acid generator, and an organic solvent onto a substrate to form a resist film; exposing the resist film with high-energy radiation after heating treatment; and performing development with a solution containing 50 mass% or more of 2-heptanone as a developing solution after heating treatment. (Where, R2 is an acid labile group.) <P>COPYRIGHT: (C)2012,JPO&INPIT |
