| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus having an advantage that an original plate holding part and a substrate holding part can be aligned in a short time. <P>SOLUTION: An exposure apparatus comprises: an original plate holding part having a first mark M1<SB POS="POST">V</SB>for measuring a position in a first direction (X) and a second mark M1<SB POS="POST">H</SB>for measuring a position in a second direction (Y); a substrate holding part having a third mark M2<SB POS="POST">V</SB>for measuring a position in the first direction and a fourth mark M2<SB POS="POST">H</SB>for measuring a position in the second direction; and a detector for detecting quantity of light that passes the third mark M2<SB POS="POST">V</SB>and quantity of light that passes the fourth mark M2<SB POS="POST">H</SB>respectively. A controller relatively moves the original plate holding part and substrate holding part in parallel in the first and second directions. Here, one of length L1<SB POS="POST">Y</SB>and length L2<SB POS="POST">Y</SB>is greater than the other, where the length L1<SB POS="POST">Y</SB>is the length of the first mark M1<SB POS="POST">V</SB>in the second direction, and the length L2<SB POS="POST">Y</SB>is the length of the third mark M2<SB POS="POST">V</SB>in the second direction. Similarly, one of length L1<SB POS="POST">X</SB>and length L2<SB POS="POST">X</SB>is greater than the other, where the length L1<SB POS="POST">X</SB>is the length of the second mark M1<SB POS="POST">H</SB>in the first direction, and the length L2<SB POS="POST">X</SB>is the length of the fourth mark M2<SB POS="POST">H</SB>in the first direction. <P>COPYRIGHT: (C)2013,JPO&INPIT |
