| 摘要 |
<p>Disclosed is a high density confined plasma source device. According to the present invention, the high density confined plasma source device includes a reactor comprising an upper chamber including an inlet for the injection of gas, a lower chamber including an outlet for the discharge of the gas, and a torus-shaped path; ferrite cores formed in the upper and lower chambers respectively; a gas supply part supplying the gas into the reactor through the inlet; and a discharging part connected to the outlet of the reactor, and discharging the gas. In the reactor, a torus-shaped cylindrical path or square path is formed. According to the present invention, high density plasma is formed in the reactor with a donut-shaped loop and an active species is more generated, the density of plasma is increased according to the number and placement of ferrite cores and permanent magnets, and a degree of the density is controlled according to the number of the magnets inserted into a chamber body, and therefore, the present invention is capable of easily handling the generation of the high efficiency active species for a processed object.</p> |
