发明名称 Photo-curable resin composition, photo-curable dry film, patterning process, protective film, and electric/electronic part
摘要 A photo-curable resin composition comprising a silicone-containing polymer, a photobase generator, a solvent, and optionally an epoxy resin crosslinker forms a coating which serves as a protective film for the protection of electric/electronic parts.
申请公布号 US9122158(B2) 申请公布日期 2015.09.01
申请号 US201313932621 申请日期 2013.07.01
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 Asai Satoshi
分类号 G03F7/075;G03F7/38;G03F7/004 主分类号 G03F7/075
代理机构 Westerman, Hattori, Daniels & Adrian, LLP 代理人 Westerman, Hattori, Daniels & Adrian, LLP
主权项 1. A photo-curable resin composition comprising (A) a silicone-containing polymer comprising recurring units of the general formula (1) and having a weight average molecular weight of 3,000 to 500,000,wherein R1 to R4 are each independently a monovalent C1-C8 hydrocarbon group, m is an integer of 1 to 100, a, b, c and d each are 0 or a positive number, a+b+c+d=1, X is a divalent organic group of the general formula (2), and Y is a divalent organic group of the general formula (3),wherein W is a divalent organic group selected from the following:n is 0 or 1, R5 and R6 are each independently a C1-C4 alkyl or alkoxy group, k is independently 0, 1 or 2,wherein V is a divalent organic group selected from the following:p is 0 or 1, R7 and R8 are each independently a C1-C4 alkyl or alkoxy group, and h is independently 0, 1 or 2, (B) a photobase generator of the general formula (4) which is decomposed with radiation of wavelength 190 to 500 nm to generate a base,wherein R9 and R10 are each independently hydrogen or a straight, branched or cyclic C1-C10 alkyl group, or R9 and R10 may bond together to form a nitrogen-containing aliphatic or aromatic ring of 3 to 8 carbon atoms with the nitrogen atom to which they are attached, which ring may have a substituent or contain a heteroatom, R11 and R12 are each independently hydrogen, a straight, branched or cyclic C1-C10 alkyl group or an optionally substituted phenyl group, Z is a monovalent organic group selected from the general formulae (Z-1) to (Z-4) and (Z-12):wherein R13 to R45 are each independently selected from the class consisting of hydrogen, halogen, an optionally substituted, straight, branched or cyclic C1-C10 alkyl group, optionally substituted C1-C6 alkoxy group, optionally substituted C2-C6 alkenyl group, optionally substituted C2-C6 alkynyl group, and optionally substituted C6-C10 aryl group, and (C) a solvent.
地址 Tokyo JP