发明名称 Compositions for solution process, electronic devices fabricated using the same, and fabrication methods thereof
摘要 Exemplary embodiments provide compositions for a solution process, electronic devices fabricated using the same, and fabrication methods thereof. An oxide nano-structure is formed using a sol-gel process. An oxide thin film transistor is formed using the oxide nano-structure.
申请公布号 US9123818(B2) 申请公布日期 2015.09.01
申请号 US201013322193 申请日期 2010.05.24
申请人 Industry-Academic Cooperation Foundation, Yonsei University 发明人 Kim Hyun Jae;Jeong Woong Hee;Ahn Byung Du;Kim Gun Hee
分类号 H01L29/786;B82Y10/00;H01L29/06;H01L27/12 主分类号 H01L29/786
代理机构 Carter, DeLuca, Farrell & Schmidt, LLP 代理人 Carter, DeLuca, Farrell & Schmidt, LLP
主权项 1. A composition for an oxide thin film, comprising: a zinc compound; and at least one non-zinc compound selected from the group consisting of a hafnium compound, a zirconium compound, a magnesium compound, and an yttrium compound, wherein a mole ratio of the zinc compound to the at least one non-zinc compound is about 1:0.1 to about 1:2, wherein a molar concentration of the zinc compound, the hafnium compound, the zirconium compound, the magnesium compound or the yttrium compound is about 0.1 mol/l (M) to about 10 mol/l (M).
地址 Seoul KR