发明名称 |
Compositions for solution process, electronic devices fabricated using the same, and fabrication methods thereof |
摘要 |
Exemplary embodiments provide compositions for a solution process, electronic devices fabricated using the same, and fabrication methods thereof. An oxide nano-structure is formed using a sol-gel process. An oxide thin film transistor is formed using the oxide nano-structure. |
申请公布号 |
US9123818(B2) |
申请公布日期 |
2015.09.01 |
申请号 |
US201013322193 |
申请日期 |
2010.05.24 |
申请人 |
Industry-Academic Cooperation Foundation, Yonsei University |
发明人 |
Kim Hyun Jae;Jeong Woong Hee;Ahn Byung Du;Kim Gun Hee |
分类号 |
H01L29/786;B82Y10/00;H01L29/06;H01L27/12 |
主分类号 |
H01L29/786 |
代理机构 |
Carter, DeLuca, Farrell & Schmidt, LLP |
代理人 |
Carter, DeLuca, Farrell & Schmidt, LLP |
主权项 |
1. A composition for an oxide thin film, comprising:
a zinc compound; and at least one non-zinc compound selected from the group consisting of a hafnium compound, a zirconium compound, a magnesium compound, and an yttrium compound, wherein a mole ratio of the zinc compound to the at least one non-zinc compound is about 1:0.1 to about 1:2, wherein a molar concentration of the zinc compound, the hafnium compound, the zirconium compound, the magnesium compound or the yttrium compound is about 0.1 mol/l (M) to about 10 mol/l (M). |
地址 |
Seoul KR |