发明名称 Semiconductor device and method
摘要 A semiconductor device includes a first compound semiconductor material including a first doping concentration and a second compound semiconductor material on the first compound semiconductor material, the second compound semiconductor material including a different material than the first compound semiconductor material. The semiconductor device further includes a control electrode and at least one buried semiconductor material region including a second doping concentration different from the first doping concentration. The at least one buried semiconductor material region is disposed in the first compound semiconductor material in a region other than a region of the first compound semiconductor material being covered by the control electrode.
申请公布号 US9123791(B2) 申请公布日期 2015.09.01
申请号 US201414151193 申请日期 2014.01.09
申请人 Infineon Technologies Austria AG 发明人 Curatola Gilberto
分类号 H01L31/072;H01L29/778;H01L29/66 主分类号 H01L31/072
代理机构 Murphy, Bilak & Homiller, PLLC 代理人 Murphy, Bilak & Homiller, PLLC
主权项 1. A semiconductor device, comprising: a first compound semiconductor material comprising a first doping concentration; a second compound semiconductor material on the first compound semiconductor material, the second compound semiconductor material comprising a different material than the first compound semiconductor material; a control electrode; at least one buried semiconductor material region comprising a second doping concentration different from the first doping concentration, wherein the at least one buried semiconductor material region is disposed in the first compound semiconductor material in a region other than a region of the first compound semiconductor material being covered by the control electrode, and a first current electrode and a second current electrode, wherein in a lateral direction, the at least one buried semiconductor material region is arranged between the first current electrode and the control electrode.
地址 Villach AT