发明名称 Nanowire field-effect transistor and method for manufacturing same
摘要 Provided are a nanowire field-effect transistor and a method for manufacturing the same. The nanowire field-effect transistor can enable a source region to be positioned, with respect to an asymmetrical nanowire channel, adjacent to a region in which the diameter of the nanowire channel is large, can enable a drain region to be positioned adjacent to a region in which the diameter of the nanowire channel is small, can enable an ON current to be increased in a state in which a threshold voltage level is kept the same, and can enable the current drivability of a gate electrode to be improved.
申请公布号 US9123695(B2) 申请公布日期 2015.09.01
申请号 US201314385450 申请日期 2013.03.11
申请人 POSTECH ACADEMY-INDUSTRY FOUNDATION 发明人 Baek ChangKi;Rim TaiUk;Ko MyungDong
分类号 H01L29/06;H01L29/423;H01L29/775;B82Y10/00;B82Y40/00;H01L29/66;H01L29/10;B82Y15/00 主分类号 H01L29/06
代理机构 Foley & Lardner LLP 代理人 Foley & Lardner LLP
主权项 1. A nanowire field-effect transistor comprising: an asymmetrical nanowire channel whose both ends have mutually different diameters; a source region that is adjacent to a region in which the diameter of the nanowire channel is large; a drain region that is adjacent to a region in which the diameter of the nanowire channel is small; a gate electrode that encloses the nanowire channel; and a gate insulation film that is positioned between the nanowire channel and the gate electrode.
地址 Pohang-Si KR