发明名称 |
Nanowire field-effect transistor and method for manufacturing same |
摘要 |
Provided are a nanowire field-effect transistor and a method for manufacturing the same. The nanowire field-effect transistor can enable a source region to be positioned, with respect to an asymmetrical nanowire channel, adjacent to a region in which the diameter of the nanowire channel is large, can enable a drain region to be positioned adjacent to a region in which the diameter of the nanowire channel is small, can enable an ON current to be increased in a state in which a threshold voltage level is kept the same, and can enable the current drivability of a gate electrode to be improved. |
申请公布号 |
US9123695(B2) |
申请公布日期 |
2015.09.01 |
申请号 |
US201314385450 |
申请日期 |
2013.03.11 |
申请人 |
POSTECH ACADEMY-INDUSTRY FOUNDATION |
发明人 |
Baek ChangKi;Rim TaiUk;Ko MyungDong |
分类号 |
H01L29/06;H01L29/423;H01L29/775;B82Y10/00;B82Y40/00;H01L29/66;H01L29/10;B82Y15/00 |
主分类号 |
H01L29/06 |
代理机构 |
Foley & Lardner LLP |
代理人 |
Foley & Lardner LLP |
主权项 |
1. A nanowire field-effect transistor comprising:
an asymmetrical nanowire channel whose both ends have mutually different diameters; a source region that is adjacent to a region in which the diameter of the nanowire channel is large; a drain region that is adjacent to a region in which the diameter of the nanowire channel is small; a gate electrode that encloses the nanowire channel; and a gate insulation film that is positioned between the nanowire channel and the gate electrode. |
地址 |
Pohang-Si KR |