发明名称 Display substrate and method of measuring pattern dimensions of display substrate
摘要 A display panel includes a plurality of pixel areas and at least one inspection area. An incident light is irradiated onto an inspection pattern disposed in the inspection area and a reflection light reflected by the inspection pattern is detected. An optical critical dimension of the inspection pattern is calculated from the reflection light, and a dimension of a pixel pattern disposed in each pixel area is calculated from the optical critical dimension of the inspection pattern. Accordingly, the dimension of the pixel pattern may be indirectly measured from the inspection pattern.
申请公布号 US9123276(B2) 申请公布日期 2015.09.01
申请号 US201313834858 申请日期 2013.03.15
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 Park Yong Jun;Kim HyungJun;Lee Young Suk;Lee Jongsoo
分类号 G01B11/14;G09G3/00;G03F7/20 主分类号 G01B11/14
代理机构 F. Chau & Associates, LLC 代理人 F. Chau & Associates, LLC
主权项 1. A display substrate comprising: a base substrate that includes a plurality of pixel areas and at least one inspection area; a plurality of gate lines disposed on a the base substrate that extend in a first direction; a plurality of data lines insulated from the gate lines that extend in a second direction crossing the first direction; a plurality of pixels disposed in the pixel areas, respectively; and an inspection pattern disposed in at least one inspection area, wherein each of the pixels comprises: a thin film transistor connected to a corresponding gate line and a corresponding data line; and a pixel electrode connected to the thin film transistor and including at least one cut-away portion, wherein the inspection pattern comprises a plurality of diffraction grids extending in the first direction and spaced apart from each other in the second direction, and wherein the at least one inspection area is disposed between two adjacent gate lines of the plurality of gate lines or two adjacent data lines of the plurality of data lines.
地址 Yongin, Gyeonggi-Do KR