Alignment mark design for semiconductor device

摘要

Better alignment mark designs for semiconductor devices may substantially lessen the frequency of layer misalignment scanner alignment problems. Exemplary alignment mark designs substantially avoid or minimize damage during the fill-in and etching and chemical mechanical processing processes. Thus, additional processing steps to even out various layers or to address the misalignment problems may also be avoided.

主权项

1. An alignment mark region of a semiconductor device, the alignment mark region comprising:
a plurality of columnar alignment marks, each columnar alignment mark having a columnar alignment mark width, wherein two adjacent columnar alignment marks are separated by a first distance, wherein two other adjacent columnar alignment marks are separated by a second distance greater than the first distance, wherein the columnar alignment mark width is less than the first distance separating the two adjacent columnar alignment marks, wherein the plurality of columnar alignment marks includes groupings, each grouping comprising two or more sets, each grouping having a grouping width, each set having two or more columnar alignment marks, and wherein two adjacent groupings are separated by a third distance substantially equivalent to the grouping width.