| 发明名称 | In-line metrology system | ||
| 摘要 | A metrology system for gauging and spatially mapping a semiconductor material on a substrate can be used in controlling deposition and thermal activation processes. | ||
| 申请公布号 | US9123584(B2) | 申请公布日期 | 2015.09.01 |
| 申请号 | US201314072406 | 申请日期 | 2013.11.05 |
| 申请人 | FIRST SOLAR, INC | 发明人 | Allenic Arnold;George, II Stephan Paul;Jayaraman Sreenivas;Karpenko Oleh Petro;Lim Chong |
| 分类号 | H01L21/02;H01L21/66;G01B11/06;G01N21/84 | 主分类号 | H01L21/02 |
| 代理机构 | Dickstein Shapiro LLP | 代理人 | Dickstein Shapiro LLP |
| 主权项 | 1. A method of manufacturing a photovoltaic device gauging and spatially mapping a semiconductor material on a substrate during a semiconductor film deposition and anneal process comprising: transporting a substrate on a conveyor; depositing a semiconductor material on the substrate; annealing the semiconductor material on the substrate; generating an optical radiation to illuminate a portion of the semiconductor material; measuring the optical property of the semiconductor material; and analyzing the measurement data to obtain the information on the band gap, absorption edge, surface roughness and thickness of the semiconductor material. | ||
| 地址 | Perrysburg OH US | ||