Process kit for RF physical vapor deposition

摘要

Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described herein relate to a process kit including a cover ring, a shield, and an isolator for use in a physical deposition chamber. The components of the process kit work alone and in combination to significantly reduce particle generation and stray plasmas. In comparison with existing multiple part shields, which provide an extended RF return path contributing to RF harmonics causing stray plasma outside the process cavity, the components of the process kit reduce the RF return path thus providing improved plasma containment in the interior processing region.

主权项

1. A one-piece ground shield for encircling a sputtering surface of a sputtering target that faces a substrata support in a substrate processing chamber, the one-piece ground shield comprising:
a cylindrical outer band having a first diameter sized to encircle the sputtering surface of the sputtering target, the cylindrical outer band having a top end sized to surround the sputtering surface and an opposing bottom end sized to surround the substrate support; a sloped step having a second diameter greater than the first diameter that extends radially outward from the top end of the cylindrical outer band; a cylindrical mounting flange extending radially outward from, and encircling a perimeter of a top end of the sloped step, having:
a lower cylindrical contact surface for resting upon an annular adapter;an upper cylindrical contact surface parallel to the lower cylindrical contact surface for supporting an isolator ring;a single continuous cylindrical inner periphery surface facing a centerline of the one-piece ground shield and extending downward from and perpendicular to the upper cylindrical contact surface, wherein the single continuous cylindrical inner periphery surface has a third diameter greater than the second diameter, wherein the single continuous cylindrical inner periphery surface forms a single continuous cylindrical shaped mounting flange step that extends radially inward from the single continuous cylindrical inner periphery surface and couples the upper cylindrical contact surface with the sloped step, and wherein the single continuous cylindrical shaped mounting flange step is spaced below the upper cylindrical contact surface and the single continuous cylindrical shaped mounting flange step is configured to provide a labyrinth gap between the isolator ring and the one-piece ground shield when the isolator ring is in contact with the one-piece ground shield; a base plate extending radially inward from the bottom end of the cylindrical outer band; and a cylindrical inner band coupled with the base plate and sized to encircle a peripheral edge of the substrate support, wherein the cylindrical mounting flange extends above the top end the cylindrical outer band, wherein the lower cylindrical contact surface of the cylindrical mounting flange is a continuous linear surface that extends below the upper cylindrical contact surface of the cylindrical mounting flange and the single continuous cylindrical shaped mounting flange step, and wherein the sloped step terminates at the single continuous cylindrical shaped mounting flange step.