感光化射线性或感放射线性树脂组成物、感光化射线性或感放射线性膜、具有感光化射线性或感放射线性膜的空白罩幕、图案形成方法、电子元件的制造方法以及电子元件;ACTINIC RAY-SENSITIVE OR RADIOACTIVE RAY-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIOACTIVE RAY-SENSITIVE FILM, MASK BLANKS HAVING ACTINIC RAY-SENSITIVE OR RADIOACTIVE RAY-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE AND ELECTRONIC DEVICE

摘要

一种感光化射线性或感放射线性树脂组成物，其包括含有由通式(4)所表示的重复单元的树脂(A)、以及含有极性基的交联剂(C)，且所述交联剂(C)为如下的化合物：由通式(1)所表示的化合物、或者经由以通式(3)中的L1所表示的连结基或单键而连结有2个~5个由通式(1)所表示的结构的化合物。(通式(1)~通式(4)中的各符号的定义如专利请求的范围中所记载般);[化1] An actinic ray-sensitive or radioactive ray-sensitive resin composition is provided, which includes a resin (A) containing a repeated unit represented by General Formula (4), and a cross-linking agent (C) containing a polar group. The cross-linking agent (C) is a compound as below: a compound represented by General Formula (1), or a compound connecting two to five structures represented by General Formula (1) through a connecting group represented by L1of General Formula (3) or a single bond. (A definition of every symbol in General Formula (1) to General Formula (4) is as described in Claims.)