发明名称 SUBSTRATE PROCESSING APPARATUS, POSITION DEVIATION CORRECTION METHOD AND STORAGE MEDIUM
摘要 <p>The purpose of the present invention is to enable a position deviation correction of a substrate with respect to a substrate holder when the substrate is held by the substrate holder. A substrate processing apparatus comprises: a first storage and a second storage (14B, 1420) where the substrate (W) can be disposed; the substrate holder (137) holding the substrate; a substrate transfer device (13) transferring the substrate between at least the first storage and the second storage; and a substrate position detection unit (1413) detecting a position of the substrate held by the substrate holder. The substrate position detection unit is disposed on the position independent from the substrate transfer device (13). Moreover, the substrate position detection unit is installed in the position capable of transferring the substrate held by the substrate holder of the substrate transfer device.</p>
申请公布号 KR20150098570(A) 申请公布日期 2015.08.28
申请号 KR20150020278 申请日期 2015.02.10
申请人 TOKYO ELECTRON LIMITED 发明人 IIDA NARUAKI;MORIKAWA KATSUHIRO
分类号 H01L21/677;H01L21/66 主分类号 H01L21/677
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