发明名称 METHOD OF FABRICATING BUMP PAD STRUCTURES HAVING BUFFER PATTERNS
摘要 Described is a method of fabricating bump pad structures having buffer patterns. The method includes the steps of: forming an upper layer on a lower layer; forming a metal wiring in the upper layer; forming a passivation layer for exposing the center region of the metal wiring on the upper layer; directly forming a buffer pattern exposing the center region of the metal wiring on a part of the passivation layer and covering selectively and asymmetrically the peripheral region of the metal wiring; forming a wrapping pattern covering the buffer pattern on the passivation layer and exposing the center region of the metal wiring; and forming a pad pattern on the center region of the metal wiring.
申请公布号 KR20150098512(A) 申请公布日期 2015.08.28
申请号 KR20140019893 申请日期 2014.02.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, SOO JAE;CHUN, HYUN SUK
分类号 H01L23/488 主分类号 H01L23/488
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