METROLOGY FOR MEASUREMENT OF PHOTOSENSITIZER CONCENTRATION WITHIN PHOTO-SENSITIZED CHEMICALLY-AMPLIFIED RESIST
摘要
Methods for measuring photosensitizer concentrations in a photo-sensitized chemically-amplified resist (PS-CAR) patterning process are described. Measured photosensitizer concentrations can be used in feedback and feedforward control of the patterning process and subsequent processing steps. Also described is a metrology target formed using PS-CAR resist, and a substrate including a plurality of such metrology targets to facilitate patterning process control.
申请公布号
WO2015127353(A1)
申请公布日期
2015.08.27
申请号
WO2015US17071
申请日期
2015.02.23
申请人
TOKYO ELECTRON LIMITED;TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人
CARCASI, MICHAEL A.;SOMERVELL, MARK H.;HOOGE, JOSHUA S.;RATHSACK, BENJAMEN M.;NAGAHARA, SEIJI