发明名称 HIGH FREQUENCY MATCHING SYSTEM
摘要 An impedance adjustment apparatus of the invention performs impedance matching using characteristic parameters, even where a high frequency power source of variable frequencies is used. The apparatus is applicable to a power supply system using a high frequency power source of variable frequencies. Characteristic parameters obtained by targeting a portion of combinations of position information (C) of a variable capacitor and output frequency information (F) of the power source are stored in a memory. A T-parameter acquisition unit acquires characteristic parameters corresponding to (Cnow, Fnow) at the current time. An output reflection coefficient calculation unit calculates a reflection coefficient of an output end. A target information specifying unit, based on the above information and a target input reflection coefficient, specifies target combination information in which a reflection coefficient of an output end approaches the target input reflection coefficient. Impedance matching is performed based on this information.
申请公布号 US2015244342(A1) 申请公布日期 2015.08.27
申请号 US201514707293 申请日期 2015.05.08
申请人 DAIHEN Corporation 发明人 SHIMOMOTO Takashi;ITADANI Koji;MITO Masakatsu
分类号 H03H7/40 主分类号 H03H7/40
代理机构 代理人
主权项
地址 Osaka JP