发明名称 Photocurable Resin Composition for Imprinting, Method for Producing Imprinting, Mold and Imprinting Mold
摘要 Provided is a photocurable resin composition for producing an imprinting mold which has superior releasability from a transfer target resin and is flexible. The photocurable resin composition does not undergo curing shrinkage when subjected to photo-imprinting as a transfer target of photo-imprinting; and is capable of producing by photo-imprinting an imprinting mold which has high surface hardness and in which the occurrence of yellowing is suppressed even when irradiated with e.g., ultraviolet ray. The photocurable resin composition for imprinting includes a (meth)acrylic monomer (A), a silicon-containing monomer (B) and a photoinitiator (C), wherein the photoinitiator includes a combination of an alkylphenone-based photoinitiator (C1) and an acylphosphine oxide-based photoinitiator (C2).
申请公布号 US2015240015(A1) 申请公布日期 2015.08.27
申请号 US201314433991 申请日期 2013.10.15
申请人 SOKEN CHEMICAL & ENGINEERING CO., LTD. 发明人 Yamada Hiroko;Suto Yasuo
分类号 C08F222/20;B29C33/38 主分类号 C08F222/20
代理机构 代理人
主权项 1. A photocurable resin composition for imprinting comprising a (meth)acrylic monomer (A), a silicon-containing monomer (B) having a reactive group copolymerizable with the component (A), and a photoinitiator (C), wherein the photoinitiator (C) comprises a combination of an alkylphenone-based photoinitiator (C1) and an acylphosphine oxide-based photoinitiator (C2).
地址 Toshima-ku, Tokyo JP