ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK

摘要

This active light sensitive or radiation sensitive resin composition contains (A) a polymer compound having a structure wherein a hydrogen atom of a phenolic hydroxyl group is substituted by a group represented by specific general formula (I), and (B) a compound that generates an acid when irradiated with active light or radiation.