METHOD FOR FORMING NANOSCALE MICROSTRUCTURE

摘要

A method for forming nanoscale microstructures by solvent etching comprises steps of preparing nanospheres and placing the nanospheres onto a surface of a liquid and allowing the nanospheres to be regularly arranged to form a template. The template is transferred to the photocurable adhesive of the substrate to form a photocured adhesive layer. After photocuring the photocurable adhesive to form a photocured adhesive layer, the substrate is removed and the template and the photocured adhesive layer are placed into a solvent with insignificant polarity to perform etching by dissolving the template with the solvent to form the nanoscale microstructure on the photocured adhesive layer. The method does not require large-scale machines, expensive equipments, and long processing time of molecular self-assembly. In addition to the above advantages, this method is not limited by size of substrates.

主权项

1. A method for forming a nanoscale microstructure, comprising steps of:
(a) preparing nanospheres; (b) injecting the nanospheres onto a surface of a liquid and allowing the nanospheres to be regularly arranged to form a first array to construct a template having a nanospherical structure; (c) lifting the template out from the surface of the liquid with an oblique plate, allowing a liquid residue to flow off from the oblique plate on which the template remains; (d) Preparing a substrate coated with a photocurable adhesive; (e) Transferring the template to the photocurable adhesive of the substrate, subsequently photocuring the photocurable adhesive to form a photocured adhesive layer, and removing the substrate from the photocured adhesive layer on which the template is retained; and (f) Placing the template and the photocured adhesive layer into a solvent with insignificant polarity to perform etching by dissolving the template with the solvent to form the nanoscale microstructure on the photocured adhesive layer.