| 摘要 |
A vaporizer for introducing a vapor-phase precursor into a substrate processing system, comprising: a vaporizer chamber having an vaporizer inlet, an vaporizer outlet, and a container wall extending between said vaporizer inlet and said vaporizer outlet and defining a vaporization volume there between, said container wall defining a lateral dimension of said vaporizer chamber; and at least one porous foam member arranged within said vaporizer chamber between said vaporizer inlet and said vaporizer outlet such that vapor flows through said at least one porous foam member, said at least one porous foam member in physical contact and thermal communication with said container wall, said at least one porous foam member having a thickness that is at least 10% said lateral dimension. The vaporizer chamber comprises an entrant chamber portion characterized by a diverging cross-sectional area with half angle of about 30-40 degrees and a vaporizer nozzle. |
