发明名称 |
LIQUID EJECTION HEAD, RECORDING APPARATUS AND HEAT RADIATION METHOD FOR LIQUID EJECTION HEAD |
摘要 |
Provided is a liquid ejection head including: a plurality of recording element substrates including energy generating elements that generate ejection energy for ejecting liquid from ejection orifices; a first support member that supports the plurality of recording element substrates such that the recording element substrates are arranged in one or more lines on a main surface of the first support member; and a second support member that supports the first support member on a surface opposite to the main surface. A first thermal resistance concerning an in-plane direction parallel to the main surface, of a region between the recording element substrates in the first support member is higher than a second thermal resistance concerning a thickness direction of the second support member, of a projection region that overlaps with each recording element substrate in the second support member. |
申请公布号 |
US2015239238(A1) |
申请公布日期 |
2015.08.27 |
申请号 |
US201514615960 |
申请日期 |
2015.02.06 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
YAMADA Kazuhiro;Moriguchi Takuto;Tamenaga Zentaro;Iwanaga Shuzo;Moriya Takatsugu |
分类号 |
B41J2/045;B41J2/14 |
主分类号 |
B41J2/045 |
代理机构 |
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代理人 |
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主权项 |
1. A liquid ejection head comprising:
a plurality of recording element substrates including energy generating elements that generate ejection energy for ejecting liquid from ejection orifices; a first support member that supports the plurality of recording element substrates such that the recording element substrates are arranged in one or more lines on a main surface of the first support member; and a second support member that supports the first support member on a surface opposite to the main surface, wherein a first thermal resistance concerning an in-plane direction parallel to the main surface, of a region between the recording element substrates in the first support member is higher than a second thermal resistance concerning a thickness direction of the second support member, of a projection region that overlaps with each recording element substrate in the second support member. |
地址 |
Tokyo JP |