发明名称 THIN FILM TRANSISTOR SUBSTRATE AND DISPLAY USING THE SAME
摘要 Provided are a thin film transistor substrate and a display using the same. A thin film transistor substrate includes: a substrate, a first thin film transistor disposed at a first area of the substrate, the first thin film transistor including: a polycrystalline semiconductor layer, a first gate electrode on the polycrystalline semiconductor layer, a first source electrode, and a first drain electrode, a second thin film transistor disposed at a second area of the substrate, the second thin film transistor including: a second gate electrode, an oxide semiconductor layer on the second gate electrode, a second source electrode, and a second drain electrode, a nitride layer disposed on an area of the substrate, other than the second area, the nitride layer covering the first gate electrode, and an oxide layer disposed: over the first gate electrode and the second gate electrode, and under the oxide semiconductor layer.
申请公布号 US2015243685(A1) 申请公布日期 2015.08.27
申请号 US201514628357 申请日期 2015.02.23
申请人 LG Display Co., Ltd. 发明人 LEE Youngjang;SON Kyungmo;CHO Seongpil;PARK Jaehoon;LEE Sohyung;NOH Sangsoon;PARK Moonho;LEE Sungjin;KO Seunghyo;JEONG Mijin
分类号 H01L27/12;H01L29/786 主分类号 H01L27/12
代理机构 代理人
主权项 1. A thin film transistor substrate, comprising: a substrate; a first thin film transistor disposed at a first area of the substrate, the first thin film transistor comprising: a polycrystalline semiconductor layer;a first gate electrode on the polycrystalline semiconductor layer;a first source electrode; anda first drain electrode; a second thin film transistor disposed at a second area of the substrate, the second thin film transistor comprising: a second gate electrode;an oxide semiconductor layer on the second gate electrode;a second source electrode; anda second drain electrode; a nitride layer disposed on an area of the substrate, other than the second area, the nitride layer covering the first gate electrode; and an oxide layer disposed: over the first gate electrode and the second gate electrode; andunder the oxide semiconductor layer.
地址 Seoul KR