METROLOGY FOR MEASUREMENT OF PHOTOSENSITIZER CONCENTRATION WITHIN PHOTO-SENSITIZED CHEMICALLY-AMPLIFIED RESIST (PS-CAR)

摘要

Methods for measuring photosensitizer concentrations in a photo-sensitized chemically-amplified resist (PS-CAR) patterning process are described. Measured photosensitizer concentrations can be used in feedback and feedforward control of the patterning process and subsequent processing steps. Also described is a metrology target formed using PS-CAR resist, and a substrate including a plurality of such metrology targets to facilitate patterning process control.

主权项

1. A method for treating a substrate, comprising:
receiving the substrate, the substrate comprising:
an underlying layer on the substrate, anda radiation-sensitive material layer on the underlying layer, the radiation-sensitive material layer comprising:
a first light wavelength activation threshold that controls the generation of acid to a first acid concentration in the radiation-sensitive material layer and controls generation of photosensitizer molecules in the radiation-sensitive material layer; anda second light wavelength activation threshold that can excite the photosensitizer molecules in the radiation-sensitive material layer that results in the acid comprising a second acid concentration that is greater than the first acid concentration, the second light wavelength being different from the first light wavelength; exposing a first wavelength of light through a patterned mask onto the radiation-sensitive material layer, the first wavelength of light comprising a wavelength in the EUV spectrum; flood exposing a second wavelength of light to the radiation-sensitive material layer, the second wavelength of light comprising a wavelength that is different from the first wavelength of light; and in a metrology system, measuring the concentration of photosensitizer molecules in the radiation-sensitive material layer.