发明名称 PHOTOSENSITIVE RESIN COMPOSITION, CURED OBJECT AND PRODUCTION METHOD THEREFOR, RESIN PATTERN PRODUCTION METHOD, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUTOFF FILTER, AND SOLID IMAGING DEVICE
摘要 The purpose of the present invention is to provide a photosensitive resin composition from which can be obtained a cured object that has excellent opacity and high surface hardness even as a thin film, to provide a cured object, a cured object production method, a cured film, and a cured film production method wherein the photosensitive resin composition is cured, to provide a resin pattern production method, and to provide a liquid crystal display device, an organic EL display device, an infrared cutoff filter, and a solid imaging device that comprise the cured film. A photosensitive resin composition according to the present invention is characterized by containing a polymer component (component A) that includes a polymer that satisfies at least one of (1) and (2), a photoacid generator (component B), a solvent (component C), and titanium black (component S). (1) A polymer that has: a structural unit (a1) that has a group wherein an acid group is protected by an acid-labile group; and a structural unit (a2) that has a cross-linkable group. (2) A polymer (a1) that has a structural unit that has a group wherein an acid group is protected by an acid-labile group, and a polymer (a2) that has a structural unit that has a cross-linkable group.
申请公布号 WO2015125870(A1) 申请公布日期 2015.08.27
申请号 WO2015JP54631 申请日期 2015.02.19
申请人 FUJIFILM CORPORATION 发明人 KASHIWAGI DAISUKE;ANDOU TAKESHI;YAMADA SATORU;KAWABE YASUMASA;TOMEBA HISAMITSU
分类号 G03F7/004;C08F212/14;C08F220/10;G02B5/20;G03F7/039;G03F7/40;H01L21/027;H01L51/50;H05B33/12 主分类号 G03F7/004
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