发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, CURED OBJECT AND PRODUCTION METHOD THEREFOR, RESIN PATTERN PRODUCTION METHOD, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUTOFF FILTER, AND SOLID IMAGING DEVICE |
摘要 |
The purpose of the present invention is to provide a photosensitive resin composition from which can be obtained a cured object that has excellent opacity and high surface hardness even as a thin film, to provide a cured object, a cured object production method, a cured film, and a cured film production method wherein the photosensitive resin composition is cured, to provide a resin pattern production method, and to provide a liquid crystal display device, an organic EL display device, an infrared cutoff filter, and a solid imaging device that comprise the cured film. A photosensitive resin composition according to the present invention is characterized by containing a polymer component (component A) that includes a polymer that satisfies at least one of (1) and (2), a photoacid generator (component B), a solvent (component C), and titanium black (component S). (1) A polymer that has: a structural unit (a1) that has a group wherein an acid group is protected by an acid-labile group; and a structural unit (a2) that has a cross-linkable group. (2) A polymer (a1) that has a structural unit that has a group wherein an acid group is protected by an acid-labile group, and a polymer (a2) that has a structural unit that has a cross-linkable group. |