发明名称 |
TREATMENT FOR ELECTROPLATING RACKS TO AVOID RACK METALLIZATION |
摘要 |
An electroplating rack for supporting non-conductive substrates during an electrodeposition process is described. The electroplating rack is coated with a non-conductive material, such as a PVC plastisol. The electroplating rack is treated with a non-aqueous solution comprising a metallization inhibitor prior to the electrodeposition process to inhibit rack plate up when using etchants that do not contain chromic acid. |
申请公布号 |
WO2015126544(A1) |
申请公布日期 |
2015.08.27 |
申请号 |
WO2015US11704 |
申请日期 |
2015.01.16 |
申请人 |
MACDERMID ACUMEN, INC. |
发明人 |
HERDMAN, RODERICK, D.;CHAPANERI, ROSHAN, V.;HYSLOP, ALISON |
分类号 |
C25D5/54;C25D5/56;C25D17/08 |
主分类号 |
C25D5/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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