发明名称 |
LITHOGRAPHIC APPARATUS AND METHOD |
摘要 |
A lithographic apparatus comprising a support structure constructed to support a mask comprising a patterned area which is capable of imparting an EUV radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4x. |
申请公布号 |
WO2015124457(A1) |
申请公布日期 |
2015.08.27 |
申请号 |
WO2015EP52673 |
申请日期 |
2015.02.10 |
申请人 |
ASML NETHERLANDS B.V.;CARL ZEISS SMT GMBH |
发明人 |
VAN SCHOOT, JAN, BERNARD, PLECHELMUS;MIGURA, SASCHA;KNEER, BERNHARD |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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