发明名称 PROCESS FOR MANUFACTURING CONDUCTIVE FILM AND PRINTED WIRING BOARD
摘要 The process for manufacturing a conductive film, said process being capable of achieving efficient progress of reduction of a metal oxide into a metal and yielding a conductive film which exhibits excellent adhesion to a substrate; and a printed wiring board. This process includes: a step for applying a dispersion which contains metal oxide particles to a substrate to form a precursor film which contains the particles; and a step for irradiating the precursor film with a continuous-wave laser beam while scanning the laser beam relatively, and thereby reducing the metal oxide in an irradiated area to form a metal-containing conductive film. In the process, the scanning speed is 1.0 m/s or more, the laser power of the continuous-wave laser beam is 6.0 W or more, and the irradiation time per point on the surface of the precursor film is 1.0 μs or more.
申请公布号 US2015245479(A1) 申请公布日期 2015.08.27
申请号 US201514708016 申请日期 2015.05.08
申请人 FUJIFILM Corporation 发明人 USAMI Yoshihisa;OHTA Hiroshi
分类号 H05K1/09;H05K3/00;H05K1/03;H05K3/10 主分类号 H05K1/09
代理机构 代理人
主权项 1. A method for manufacturing a conductive film, comprising the steps of: forming a precursor film containing particles of a metal oxide by applying a dispersion liquid containing the particles onto a substrate; and irradiating the precursor film with a continuous wave laser beam under relative scanning of the precursor film and the continuous wave laser beam, so as to reduce the metal oxide and thus form a metal-containing conductive film in a region irradiated with the continuous wave laser beam, wherein: the relative scanning is carried out at a speed not less than 1.0 m/s; the continuous wave laser beam has a laser power not less than 6.0 W; and the precursor film is irradiated at an irradiation time per spot on its surface of not less than 1.0 μs.
地址 Tokyo JP