| 发明名称 |
Method for Improving Chemical Resistance of Polymerized Film, Polymerized Film Forming Method, Film Forming Apparatus, and Electronic Product Manufacturing Method |
| 摘要 |
A method for improving a chemical resistance of a polymerized film, which is formed on a surface of a target object and to be processed by a chemical, includes: consecutively performing a treatment for improving the chemical resistance of the polymerized film subsequent to formation of the polymerized film within a processing chamber of a film forming apparatus where the polymerized film is formed, without unloading the target object from the processing chamber. |
| 申请公布号 |
US2015240121(A1) |
申请公布日期 |
2015.08.27 |
| 申请号 |
US201514632311 |
申请日期 |
2015.02.26 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SUGITA Kippei;YAMAGUCHI Tatsuya;MORISADA Yoshinori;FUJIKAWA Makoto |
| 分类号 |
C09D179/08;C23C16/52;C23C16/455;C23C16/46;C23C16/44 |
主分类号 |
C09D179/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for improving a chemical resistance of a polymerized film, which is formed on a surface of a target object and to be processed by a chemical, the method comprising:
consecutively performing a treatment for improving the chemical resistance of the polymerized film subsequent to formation of the polymerized film within a processing chamber of a film forming apparatus where the polymerized film is formed, without unloading the target object from the processing chamber. |
| 地址 |
Tokyo JP |
