High Aspect Ratio Structure Analysis

摘要

Curtaining artifacts on high aspect ratio features are reduced by reducing the distance between a protective layer and feature of interest. For example, the ion beam can mill at an angle to the work piece surface to create a sloped surface. A protective layer is deposited onto the sloped surface, and the ion beam mills through the protective layer to expose the feature of interest for analysis. The sloped mill positions the protective layer close to the feature of interest to reduce curtaining.

主权项

1. A method of exposing a region of interest on a work piece using a charged particle beam, comprising:
ion beam milling a trench at a first non-normal angle to the work piece top surface to expose a surface adjacent the region of interest and angled with respect to the work piece surface; depositing a protective layer on a portion of the exposed surface adjacent to the region of interest; ion beam milling, at an angle substantially normal to the work piece top surface, a portion of the surface adjacent to the region of interest to expose the region of interest; and observing the region of interest by charged particle beam imaging.