INSULATION-LAYER MATERIAL FOR ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

An object of the present invention is to provide an electronic device insulating layer material capable of forming an insulating layer at low temperature. A solution to the problem is an electronic device insulating layer material comprising: a polymer compound (A) which contains a repeating unit containing a cyclic ether structure and a repeating unit represented by the formula:
wherein R 5 represents a hydrogen atom or a methyl group; R bb represents a linking moiety which links the main chain of the polymer compound with a side chain of the polymer compound and optionally has a fluorine atom; R represents an organic group capable of being detached by an acid; R' represents a hydrogen atom or a monovalent organic group having from 1 to 20 carbon atoms and optionally having a fluorine atoms; the suffix b represents an integer of 0 or 1, and the suffix n represents an integer of from 1 to 5; when there are two or more Rs, they may be the same or different; and when there are two or more R's, they may be the same or different; and tungsten (V) alkoxide (B).