| 摘要 |
<p>The present invention relates to a cleaning method of a photoresist bowl and a cleaning device. The cleaning device of the present invention can rapidly and effectively clean a resist film which is hardened and degenerated at room temperature, and recycle ethylene carbonate used as a cleaning solution by using materials and methods which are environmentally compatible and ozone. Moreover, the cleaning device of the present invention includes a plurality of filters to prevent the degradation of cleaning performance by all kinds of acid materials which are accumulated among the cleaning solutions when a plurality of photoresist bowls is cleaned.</p> |
