发明名称 Beam position monitoring apparatus and charged particle beam irradiation system
摘要 A scanning magnet (28, 29) of an irradiation nozzle (27) is controlled to irradiate the ion beam irradiated from a synchrotron accelerator to a target position P i,j of a spot i,j in a certain layer L i of a target volume, using a scanning control apparatus (40). A deviation D j between the target position P i,j and an actual irradiation position Pa i,j is obtained. Using the deviation D j , a systematic error Es i,j and a random error Er i,j of the actual irradiation position Pa i,j are obtained. Whether the systematic error Es i,j exists within a first permissible range of the systematic error Es i,j is determined. Whether the random error Er i,j exists within a second permissible range of the random error Er i,j is determined. When the systematic error Es i,j or the random error Er i,j is deviated from the permissible range, the irradiation of the ion beam to the target volume is stopped.
申请公布号 EP2910279(A1) 申请公布日期 2015.08.26
申请号 EP20150156580 申请日期 2015.02.25
申请人 HITACHI, LTD. 发明人 NISHIMURA, ARAO;AKIYAMA, HIROSHI;SHINAGAWA, RYOSUKE;FUJITA, TAKESHI
分类号 A61N5/10 主分类号 A61N5/10
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