发明名称 |
HEAT TREATMENT METHOD OF SYNTHETIC QUARTZ GLASS |
摘要 |
A method for heat treating a synthetic quartz glass having a hydroxyl concentration with a maximum/minimum difference (”OH) of less than 350 ppm involves the steps of first heat treatment of holding at 1,150-1,060°C for a time of 0.5-10 hours, cooling down to a second heat treatment temperature at a rate of -7°C/hr to -30°C/hr, second heat treatment of holding at 1,030-950°C for a time of 5-20 hours, and annealing at a rate of -25°C/hr to -85°C/hr. Two stages of heat treatment ensures that the glass has a low birefringence. A method for heat treating a synthetic quartz glass having a hydroxyl concentration with a maximum/minimum difference (”OH) of at least 350 ppm involves first and second heat treatments and annealing, wherein the duration of the second heat treatment is from 10 to 15 hours |
申请公布号 |
EP2910531(A1) |
申请公布日期 |
2015.08.26 |
申请号 |
EP20150155463 |
申请日期 |
2015.02.17 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
YAGI, HISASHI;TAKEUCHI, MASAKI;HARADA, DAIJITSU |
分类号 |
C03B20/00;C03B19/14;C03B32/00 |
主分类号 |
C03B20/00 |
代理机构 |
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代理人 |
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地址 |
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