发明名称 PHOTOCURABLE RESIN COMPOSITION FOR IMPRINTING, METHOD FOR PRODUCING MOLD FOR IMPRINTING, AND MOLD FOR IMPRINTING
摘要 Provided is a photocurable resin composition for producing an imprinting mold which has superior releasability from a transfer target resin and is flexible. The photocurable resin composition does not undergo curing shrinkage when subjected to photo-imprinting as a transfer target of photo-imprinting; and is capable of producing by photo-imprinting an imprinting mold which has high surface hardness and in which the occurrence of yellowing is suppressed even when irradiated with e.g., ultraviolet ray. The photocurable resin composition for imprinting includes a (meth)acrylic monomer (A), a silicon-containing monomer (B) and a photoinitiator (C), wherein the photoinitiator includes a combination of an alkylphenone-based photoinitiator (C1) and an acylphosphine oxide-based photoinitiator (C2).
申请公布号 EP2911184(A1) 申请公布日期 2015.08.26
申请号 EP20130848733 申请日期 2013.10.15
申请人 SOKEN CHEMICAL & ENGINEERING CO., LTD. 发明人 YAMADA, HIROKO;SUTO, YASUO
分类号 G03F7/00;B29C33/38;B29C33/40;B29C59/02;B29L31/00;C08F2/48;G03F7/027;G03F7/029;G03F7/031;G03F7/075 主分类号 G03F7/00
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