| 摘要 |
<p>The projection exposure device (1) has an illuminating optical unit (4) for illuminating an object field in an object plane (5). A correction screen (17) is arranged in or adjacent to an aperture diaphragm plane of the projection optical unit (6). The correction screen covers the illumination of the entry aperture diaphragm of the projection optical unit in such a manner that some source pictures in the entry aperture diaphragm of the projection optical unit, which are assigned a individual bevels of the aperture diaphragm beveled mirror (15) are partially shadowed by one and same screen edge. Independent claims are also included for the following: (1) an illuminating optical unit with a diaphragm beveled mirror (2) a method for operation of a projection exposure device (3) a method for manufacturing a microstructure component (4) microstructure component.</p> |
