GAS DISPENSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS

摘要

The present invention relates to a gas dispensing apparatus capable of supplying and distributing a gas to the injection hole of a gas injection part, and a substrate processing apparatus. The gas dispensing apparatus may include the body of a gas injection part which has a gas inlet on one side and an injection hole on the other side, and has a gas receiving space; a first diffusion plate which is installed between the gas inlet and the injection hole to firstly distribute the flow of the gas; a second diffusion plate which faces the first diffusion plate and is installed between the first diffusion plate and the injection hole to secondarily distribute the flow of the gas; and a connection member which connects the first diffusion plate to the second diffusion plate.