FABRICATION OF CRITICAL LAYERS OF INTEGRATED COMPUTATIONAL ELEMENTS

摘要

A design of an integrated computational element (ICE) includes (1) specification of a substrate and multiple layers, their respective target thicknesses and refractive indices, refractive indices of adjacent layers being different from each other, and a notional ICE fabricated based on the ICE design being related to a characteristic of a sample, and (2) identification of one or more critical layers of the ICE layers, an ICE layer being identified as a critical layer if potential variations of its thickness or refractive index due to expected fabrication variations cause ICE performance degradation that exceeds a threshold degradation, otherwise the ICE layer being identified as a non-critical layer. At least one critical layer of the ICE is formed using two or more forming steps to form respective two or more sub-layers of the critical layer, and at least one non-critical layer of the ICE is formed using a single forming step.