发明名称 |
STORAGE AND SUB-ATMOSPHERIC DELIVERY OF DOPANT COMPOSITIONS FOR CARBON ION IMPLANTATION |
摘要 |
A supply source for delivery of a CO-containing dopant gas composition is provided. The composition includes a controlled amount of a diluent gas mixture such as xenon and hydrogen, which are each provided at controlled volumetric ratios to ensure optimal carbon ion implantation performance. The composition can be packaged as a dopant gas kit consisting of a CO-containing supply source and a diluent mixture supply source. Alternatively, the composition can be pre-mixed and introduced from a single source that can be actuated in response to a sub-atmospheric condition achieved along the discharge flow path to allow a controlled flow of the dopant mixture from the interior volume of the device into an ion source apparatus. |
申请公布号 |
KR20150096767(A) |
申请公布日期 |
2015.08.25 |
申请号 |
KR20157019385 |
申请日期 |
2013.12.20 |
申请人 |
PRAXAIR TECHNOLOGY INC. |
发明人 |
SINHA ASHWINI K.;HEIDERMAN DOUGLAS C.;BROWN LLOYD A.;CAMPEAU SERGE M.;SHIH ROBERT;LU DRAGONNO;CHIU WEN PIN;KAO CHIEN KANG |
分类号 |
H01J37/317;C01B3/00;C23C14/34;F17C13/04;H01J37/08;H01J37/30;H01L21/265 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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