发明名称 |
Current insulated bearing components and bearings |
摘要 |
Disclosed is a bearing component having at least one layer having a high hardness and a high current insulation property, the layer comprising a nonconductive oxide layer selected from the group comprising an Al2O3 layer, a TaO layer, an SiO2 layer, a mixed layer comprising two or more of the foregoing oxides, a multilayer structure comprising alternating layers of two or more of the foregoing oxides and a DLC layer such as a ta-C layer, there being at least one ALD layer comprising at least one layer of a material deposited by an ALD (atomic layer deposition) process on the at least one layer having a high hardness and a high current insulation property, the ALD layer itself having a high current insulation property and comprising a material or layer structure selected from the said group of materials. |
申请公布号 |
US9115755(B2) |
申请公布日期 |
2015.08.25 |
申请号 |
US201213728895 |
申请日期 |
2012.12.27 |
申请人 |
Picosun OY |
发明人 |
Kolev Ivan;Peeters Paul;Tap Roland;Haag Bertram;Musayev Yashar;Kursawe Serge;Hosenfeldt Tim Matthias;Gierl Jürgen;Kostamo Juhana |
分类号 |
C23C16/50;F16C33/02;F16C33/38;F16C33/62;F16C33/46;F16C33/64;C23C16/455;F16C41/00;F16C33/32;F16C33/34;F16C33/04;F16C33/44;F16C33/56 |
主分类号 |
C23C16/50 |
代理机构 |
Ziegler IP Law Group, LLC |
代理人 |
Ziegler IP Law Group, LLC |
主权项 |
1. A bearing component of steel, the bearing component having:
at least one layer having a high hardness and a high current insulation property applied by at least one of a PVD (physical vapor deposition) process, a CVD (chemical vapor deposition) process, and a PECVD (plasma enhanced chemical vapor deposition) process (but excluding an ALD (atomic layer deposition) process or a plasma enhanced ALD process) at at least one surface region of said component, said at least one layer comprising a non-conductive oxide layer selected from the group of materials comprising an Al2O3 layer, a TaxOy layer, an SixOy layer, a mixed layer comprising two or more of the foregoing oxides, a multilayer structure comprising alternating layers of two or more of the foregoing oxides and a DLC (diamond-like carbon) layer; and at least one ALD layer comprising at least one layer of a material deposited by an ALD process on said at least one layer having a high hardness and a high current insulation property, the ALD layer itself having a high current insulation property and comprising a material or layer structure selected from the group of materials comprising an Al2O3 layer, a TaxOy layer, an SixOy layer, a TiO2 layer, an HfO2 layer, a mixed layer comprising two or more of the foregoing oxides, and a multilayer structure comprising alternating layer of two or more of the foregoing oxides. |
地址 |
Espoo FI |