发明名称 Magnetoresistance element and magnetic memory
摘要 A magnetoresistance element includes a first magnetic layer having first and second surfaces, a second magnetic layer, an intermediate layer provided between the first surface and the second magnetic layer, a first layer provided on the second surface, containing B and at least one element selected from Hf, Al, Mg, and Ti and having third and fourth surfaces, a second layer provided on the fourth surface and containing B and at least one element selected from Hf, Al, and Mg, and an insulating layer provided on a sidewall of the intermediate layer and containing at least one element selected from the Hf, Al, and Mg contained in the second layer.
申请公布号 US9117995(B2) 申请公布日期 2015.08.25
申请号 US201314023772 申请日期 2013.09.11
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 Daibou Tadaomi;Kitagawa Eiji;Kamata Chikayoshi;Kashiwada Saori;Kato Yushi;Yakabe Megumi
分类号 H01L43/08;H01L43/10;H01L27/22 主分类号 H01L43/08
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A magnetoresistance element comprising: a first magnetic layer having a first surface and a second surface being opposite to the first surface; a second magnetic layer; an intermediate layer which is provided between the first surface of the first magnetic layer and the second magnetic layer; a first layer which is provided on the second surface of the first magnetic layer, the first layer containing B and at least one element selected from Hf, Al, Mg, and Ti and having a third surface and a fourth surface being opposite to the third surface, the third surface facing the second surface; a second layer which is provided on the fourth surface of the first layer, the second layer containing B and at least one element selected from Hf, Al, and Mg and having a fifth surface and a sixth surface being opposite to the fifth surface, the fifth surface facing the fourth surface; and an insulating layer which is provided on a sidewall of the intermediate layer, the insulating layer containing at least one element selected from the Hf, Al, and Mg contained in the second layer.
地址 Minato-ku JP