发明名称 |
Process for making lithographic printing plate |
摘要 |
A process for making a lithographic printing plate is provided that includes a step of producing a negative-working lithographic printing plate precursor comprising, above a support, a photopolymerizable photosensitive layer comprising a vinylcarbazole compound-derived monomer unit-containing acrylic polymer and/or a urethane-acrylic hybrid polymer, a step of imagewise exposing the negative-working lithographic printing plate precursor, and a step of developing the exposed negative-working lithographic printing plate precursor using a developer comprising (Component A) an organic solvent having a solubility in water at 20° C. of 1.5 to 7.0 g/100 mL, (Component B) an amphoteric surfactant represented by Formula (I) below and/or Formula (II) below, and (Component C) water.; |
申请公布号 |
US9114602(B2) |
申请公布日期 |
2015.08.25 |
申请号 |
US201314039857 |
申请日期 |
2013.09.27 |
申请人 |
FUJIFILM Corporation |
发明人 |
Sonokawa Koji |
分类号 |
G03F7/00;B41C1/10;G03F7/038;G03F7/32;G03F7/032;G03F7/033;G03F7/035;G03F7/105 |
主分类号 |
G03F7/00 |
代理机构 |
Sughrue Mion, PLLC |
代理人 |
Sughrue Mion, PLLC |
主权项 |
1. A process for making a lithographic printing plate comprising
a step of preparing a negative-working lithographic printing plate precursor comprising, above a support, a photopolymerizable photosensitive layer comprising a vinylcarbazole compound-derived monomer unit-containing acrylic polymer and/or a urethane-acrylic hybrid polymer, a step of imagewise exposing the negative-working lithographic printing plate precursor, and a step of developing the exposed negative-working lithographic printing plate precursor using a developer comprising (Component A) an organic solvent having a solubility in water at 20° C. of 1.5 to 7.0 g/100 mL, (Component B) an amphoteric surfactant represented by Formula (I) below and/or Formula (II) below, and (Component C) water wherein in Formula (I) R1 to R3 independently denote an alkyl group, in Formula (II) R4 to R6 independently denote an alkyl group, L denotes an alkylene group, and A denotes a carboxylate ion or a sulfonate ion. |
地址 |
Tokyo JP |