发明名称 Laser based processing of layered materials
摘要 Systems and methods for laser based processing of layered materials. Methods may include selectively adjusting ultrafast laser output of an ultrafast laser device based upon one or more physical attributes of a layer of the layered material, applying the ultrafast laser output of the ultrafast laser device to the layer of the layered material along a tool path to ablate the layer along the tool path, and then re-executing the steps to ablate one or more additional layers, the re-execution occurring for each distinct layer of the layered material that is to be ablated.
申请公布号 US9114482(B2) 申请公布日期 2015.08.25
申请号 US201113234751 申请日期 2011.09.16
申请人 Raydiance, Inc. 发明人 Srinivas Ramanujapuram A.;Greenberg Michael;Gaudiosi David;Mielke Michael;Booth Tim
分类号 B23K26/40;B23K26/36 主分类号 B23K26/40
代理机构 Haverstock & Owens LLP 代理人 Haverstock & Owens LLP
主权项 1. A method for selectively ablating one or more layers of a layered material, the method comprising: (a) using a sensing device to determine one or more physical attributes of a layer of the layered material and selectively adjusting ultrafast laser output of an ultrafast laser device before an application of the ultrafast laser output based upon the one or more physical attributes of the layer of the layered material; (b) applying the ultrafast laser output of the ultrafast laser device to the layer of the layered material along a tool path to ablate the layer along the tool path; (c) re-executing steps (a) and (b) to ablate one or more additional layers, the re-execution of steps (a) and (b) occurring for each distinct layer of the layered material that is to be ablated; wherein the selective ablation of the layered material prepares the layered material for subsequent processing, wherein applying the ultrafast laser output to the one or more additional layers occurs substantially simultaneously relative to the applying ultrafast laser output to a getter layer, wherein the additional layer being disposed below an ablated portion of the getter layer.
地址 Petaluma CA US