Method of stencil mapped shadowing

摘要

Aspects comprise shadowing method as part of ray tracing. It is based on uniform grid of cells, and on local stencils in cells. The acceleration structures are abandoned along with high traversal and construction costs of these structures. The amount of intersection tests is cut down. The stencils are generated in the preprocessing stage and utilized in runtime. The relevant part of scene data, critical for shadowing of all visible intersection points in a cell, is registered in the local stencil map, as a volumetric data. The runtime use of stencils allows a complete locality at each cell, enhanced utilization of processing resources and load balancing of parallel processing.

主权项

1. A shadowing method in a ray-tracing computing system, implemented on a 3D data of scene, having defined objects and light sources, comprising the steps of:
A. during preprocessing on a multiprocessing system
a. dividing the 3D data of scene into uniform grid of cells;b. mapping scene objects onto said grid of cells;c. for each light source in the scene
i. registering all light occluding objects per each cell in a volumetric stencil map of raster fragments; B. during runtime on a multiprocessing system
d. for each light source in the scene
i. testing for shadow all hit points in each cell by analyzing fragments of the stencil map of raster fragments, said fragments surrounding a hit point;ii. performing intersection tests with light blocking objects in cases of uncertainty.