Lithographic apparatus and method

摘要

A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus further comprises a patterning device masking blade provided with a hole, a diffusing material being located at the hole.

主权项

1. A lithographic apparatus, comprising:
an illumination system configured to provide a beam of radiation; a support structure configured to support a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a patterning device masking blade provided with a hole comprising inner edges and a diffusing material being located in the hole and upstream of the inner edges such that the radiation beam passes through the diffusing material before it is incident upon the inner edges.