发明名称 Fluorinated monomer, polymer, resist composition, and patterning process
摘要 A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R4 to R6 each are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.;
申请公布号 US9115074(B2) 申请公布日期 2015.08.25
申请号 US201314142588 申请日期 2013.12.27
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 Sagehashi Masayoshi;Hasegawa Koji;Sasami Takeshi
分类号 C07C69/013;C07C69/653;G03F7/004;C07D317/34;C07D317/72;C08F220/22;C08F220/24;C08F220/18;C08F222/18;C08F222/20;C08F222/22;C08F220/28;G03F7/039;C08F24/00 主分类号 C07C69/013
代理机构 Birch, Stewart, Kolasch & Birch, LLP 代理人 Birch, Stewart, Kolasch & Birch, LLP
主权项 1. A fluorinated monomer having the general formula (1): wherein R1 is hydrogen, fluorine, methyl or trifluoromethyl, R2 and R3 are each independently hydrogen or a straight, branched or cyclic C1-C15 monovalent hydrocarbon group, R2 and R3 may bond together to form a non-aromatic ring with the carbon atom to which they are attached, R4 to R6 each are a C1-C6 monovalent fluorinated hydrocarbon group, A is a straight, branched or cyclic C1-C10 divalent hydrocarbon group, and k1 is an integer of 0 to 2.
地址 Tokyo JP