发明名称 Inject insert liner assemblies for chemical vapor deposition systems and methods of using same
摘要 A system for depositing a layer on a substrate includes a processing chamber, a gas injecting port for introducing gas into the system, a gas distribution plate disposed between the gas injecting port and the processing chamber, the gas distribution plate including holes therein, and an inject insert liner assembly received within the system adjacent to the gas distribution plate and upstream from the processing chamber. The inject insert liner assembly defines gas flow channels therein extending along a lengthwise direction of the system, wherein each channel includes an inlet and an outlet, and at least one channel is tapered along the lengthwise direction of the system in at least one of a vertical or horizontal direction. The inject insert liner assembly has the same number of gas flow channels as the number of holes in the gas distribution plate.
申请公布号 US9117670(B2) 申请公布日期 2015.08.25
申请号 US201313829021 申请日期 2013.03.14
申请人 SunEdison Semiconductor Limited (UEN201334164H) 发明人 Abedijaberi Arash;Pitney John Allen;Thomas Shawn
分类号 C23F1/00;H01L21/306;H01L21/02;C23C16/455 主分类号 C23F1/00
代理机构 Armstrong Teasdale LLP 代理人 Armstrong Teasdale LLP
主权项 1. A system for depositing a layer on a substrate, the system comprising: a processing chamber; a gas injecting port for introducing gas into the system, the gas injecting port disposed upstream from the processing chamber; a gas distribution plate disposed between the gas injecting port and the processing chamber, the gas distribution plate including holes therein; an inject insert liner assembly received within the system adjacent to the gas distribution plate and upstream from the processing chamber, the inject insert liner assembly defining gas flow channels therein extending along a lengthwise direction of the system, wherein the inject insert liner assembly defines an inlet of each channel adjacent to the gas distribution plate and an outlet of each channel downstream from the inlet; and a chamber liner positioned adjacent to and downstream from the inject insert liner assembly, the chamber liner at least partially defining a gas inlet in fluid communication with at least one of the gas flow channels defined by the inject insert liner assembly; wherein at least one of the gas flow channels is tapered between the channel inlet and the channel outlet along the lengthwise direction of the system in at least one of a vertical or horizontal direction, and wherein the inject insert liner assembly has the same number of gas flow channels as the number of holes in the gas distribution plate.
地址 Singapore SG