Ion implantation method, carrier, and ion implantation device

摘要

An ion implantation method includes: placing, in an atmosphere, a mask, which is used in conjunction with a tray for accommodating a substrate for a solar cell, at a first position covering a partial area on a surface of the substrate while maintaining the mask aligned relative to the substrate or at a second position distanced from the surface of the substrate; implanting, in a vacuum, ions in a first area on the surface of the substrate while the mask is placed at the first position; and implanting, in a vacuum, ions in a second area on the surface of the substrate while the mask is placed at the second position.

主权项

1. A carrier for carrying a substrate for a solar cell into an ion implantation device, comprising:
the carrier is configured to carry the substrate from an atmosphere into a process chamber of an ion implantation device; a tray configured to accommodate the substrate; a mask configured to be moved between a first position covering a partial area on a surface of the substrate and a second position distanced from the surface of the substrate, while the mask is being aligned relative to the substrate; and a joining mechanism configured to join the mask and the tray so that the mask is moveable between the first position and the second position.