Conductive line system and process

摘要

A system and method for providing a conductive line is provided. In an embodiment the conductive line is formed by forming two passivation layers, wherein each passivation layer is independently patterned. Once formed, a seed layer is deposited into the two passivation layers, and a conductive material is deposited to fill and overfill the patterns within the two passivation layers. A planarization process such as a chemical mechanical polish may then be utilized in order to remove excess conductive material and form the conductive lines within the two passivation layers.

主权项

1. A semiconductor device comprising:
a patterned negative tone photosensitive material over a substrate, the patterned negative tone photosensitive material comprising first openings; a patterned positive tone photosensitive material over the patterned negative tone photosensitive material, the patterned positive tone photosensitive material comprising second openings, wherein the patterned negative tone photosensitive material extends from a first sidewall of a first one of the second openings to a second sidewall of the first one of the second openings; a seed layer extending along sidewalls of the second openings; and a conductive material adjacent to the seed layer.