ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK HAVING ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE AND NEW COMPOUND

摘要

PROBLEM TO BE SOLVED: To provide an active light-sensitive or radiation-sensitive resin composition capable of forming a pattern which prevents the generation of scum or bridges, has excellent resolution and satisfies small line edge roughness (LER), and to provide an active light-sensitive or radiation-sensitive film using the same, a mask blank having the film and a method for forming a pattern.SOLUTION: There is provided an active light-sensitive or radiation-sensitive resin composition which comprises a crosslinking agent having a polarity converting group and an alkali-soluble resin, wherein the polarity converting group is decomposed by an action of an alkaline aqueous solution to generate carboxylic acid or sulfonic acid on a side having a crosslinking group.